Mechanisms of Nitrogen Incorporation at 4H-SiC/SiO2 Interface During Nitric Oxide Passivation – A First Principles Study Date: September 29, 2022Time: 12:00 am - 12:00 am By D. P. Ettisserry, N. Goldsman, A. Akturk, and A. J. LelisMay 2016, Material Science Forum, Volume 858, Pages 465-468 mrouiller Modeling of Oxygen Vacancy Hole Trap Activation in 4H-SiC MOSFETs Using Density Functional Theory and Rate Equation Analysis SPICE Modeling of Advanced Silicon Carbide High Temperature Integrated Circuits